パン半導体産業における酸化物セラミックス

1、Brief introduction
Oxide ceramics are an important type of inorganic non-metallic material, characterized by high hardness, high wear resistance, corrosion resistance, low coefficient of expansion, and good insulation performance. In the pan semiconductor industry, commonly used oxide ceramics mainly include alumina ceramics (Al ₂ O3) and zirconia ceramics (ZrO ₂). These materials have become indispensable key materials in semiconductor equipment manufacturing due to their excellent physical and chemical properties.

（1）酸化アルミニウムセラミックス
Alumina ceramics have characteristics such as high purity, high hardness, low thermal conductivity, good electrical insulation, and high temperature resistance. Its purity is usually required to be above 99%, or even higher, to meet the strict requirements for material purity in the semiconductor manufacturing process. Alumina ceramics are widely used in various semiconductor equipment components such as etching machine chambers, vacuum suction cups, electrostatic suction cups, mechanical handling arms, gas nozzles, and wafer polishing discs.

（2）ジルコニアセラミックス
Zirconia ceramics are known for their high melting point, low thermal conductivity, high oxidation resistance, and excellent mechanical properties. Its application in semiconductor equipment includes key components such as ceramic cleavers. The microstructure of zirconia ceramics is uniform and dense, with high density, which can effectively reduce wear and improve service life.

2、 Application
Oxide ceramics are widely used in the semiconductor industry, covering multiple stages from manufacturing equipment to process components.
（1） Etching equipment
Aluminum oxide ceramics are widely used as protective materials for etching machine chambers and internal components in semiconductor etching equipment. High purity alumina coating or bulk ceramics can effectively resist plasma corrosion, reduce the generation of impurity particles, thereby improving the yield of wafers and the stability of etching processes.

（2） Wafer processing

1. Vacuum suction cup: Aluminum oxide ceramic vacuum suction cup fixes the wafer by vacuum suction, avoiding contamination or damage to the wafer during processing.
2. Electrostatic suction cup: Aluminum oxide ceramic electrostatic suction cup uses Coulomb force to adsorb wafers, which has the advantages of uniform adsorption, no warping deformation, and low pollution, and is suitable for high vacuum environments.
3. Mechanical handling arm: Aluminum oxide ceramic mechanical handling arm is used to handle wafers in a vacuum environment. Its high hardness, wear resistance, and good insulation properties make it an ideal material.

（3） Polishing and Grinding
Aluminum oxide ceramic polishing disc is a key component in wafer polishing technology, and its high purity and good surface roughness control can effectively improve the quality of wafers.

（4） Gas nozzle
In plasma cleaning and etching processes, the alumina ceramic gas nozzle can withstand the erosion of highly corrosive gases while precisely controlling the gas flow rate.

3、カスタマイズの詳細
Customized services for oxide ceramic products are particularly important in the semiconductor industry, as different equipment and processes have specific requirements for material properties and shapes.
（1） Customization capability

1. Material purity: According to customer requirements, we provide alumina and zirconia ceramic materials with different purities ranging from 99% to 99.99%.
2. Size and shape: Various sizes and complex shapes of ceramic components can be customized, such as ultra-thin ceramic long plates, vacuum suction cups, electrostatic suction cups, mechanical handling arms, etc.
3. Surface treatment: Provide high-precision surface treatment services to ensure the surface smoothness, scratch free, and pollution-free of ceramic components.

（2） Processing technology
Customized services cover the entire process from powder manufacturing to final product, including powder preparation, molding, sintering, precision machining, testing, and cleaning. For example, Jingcheng Special Ceramics customized 997 alumina ceramic long plates for semiconductor enterprises, with a length of nearly 2 meters and a thickness of only 7 millimeters, demonstrating its strong processing capabilities.

（3） Quality control
Customized oxide ceramic products require strict quality testing to ensure they meet the rigorous standards of the semiconductor industry. For example, the impurity content, sintering activity, and microstructure uniformity of high-purity alumina ceramic components need to be strictly controlled.

（4） Application Cases

1. Etching machine chamber: The customized high-purity alumina ceramic chamber can effectively improve the stability and crystal yield of the etching process.
2. Vacuum suction cup: Customized alumina ceramic vacuum suction cup is used for wafer fixation and processing, ensuring the stability and cleanliness of the wafer during processing.
3. Mechanical handling arm: The customized alumina ceramic mechanical handling arm handles wafers in a vacuum environment, and its high hardness and wear resistance make it an ideal material.

Oxide ceramics are widely used in the semiconductor industry, and their high purity, hardness, corrosion resistance, and excellent insulation properties make them key materials in semiconductor equipment manufacturing. By providing customized services, we can meet the specific material requirements of different equipment and processes, thereby promoting the sustainable development of the semiconductor industry.

Brudeze Ceramicsは、アルミナセラミックス、ジルコニアセラミックス、窒化ケイ素セラミックス、窒化アルミニウムセラミックス、炭化ケイ素セラミックス、炭化ホウ素セラミックス、バイオセラミックス、マシナブルセラミックスなど、高品質の石英ガラスを幅広く供給・販売しています。様々なセラミック製品のカスタマイズ要求にもお応えします。